Beschichtungs- und Entwicklungsvorrichtung

EP2405478 Art B1 5. September 2018

Anmelder: Tokyo Electron Limited 🇯🇵

Details

Veröffentlichungs-Nr.
EP2405478
Aktenzeichen
EP11173235
Anmeldetag
8. Juli 2011
Veröffentlichung
5. September 2018
Erteilung
5. September 2018
Rechtsraum
EP
IPC
H01L21/67
Offizieller Volltext

Abstract

In one embodiment, a coating and developing apparatus includes a processing block having at least one coating film-forming unit block stack and a developing unit block stack which are vertically stacked on each other. Each unit block stack is composed of unit blocks vertically stacked on each other, and each unit block includes processing modules containing liquid processing modules and heating modules, each unit block is provided therein with a transport mechanism that moves along a transport passage, extending linearly from a carrier block side to an interface block side, to transport the substrate between the processing modules belonging to the unit block. First transfer units are each provided on the carrier block sides of the coating film-forming unit blocks and the developing unit blocks respectively, for transferring the substrate to and from the transport mechanism of the associated coating film-forming block or developing unit block. A first transfer mechanism transfers a substrate removed from a carrier to one of the first transfer units associated with the coating film-forming unit blocks.

Anmelder

Firma
Tokyo Electron Limited
Land
🇯🇵 Japan
🇯🇵 Tokyo Electron

Japanisches Technologieunternehmen mit Sitz in Tokio, einer der weltweit größten Hersteller von Halbleiterfertigungsanlagen. Aktiv in Beschichtungs-, Ätz- und Reinigungssystemen für die Chip- und Displayproduktion.

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