Verfahren zum molekularen Adhäsionsbonden bei geringem Druck
Anmelder: Soitec, S.O.I. Tec Silicon on Insulator Technologies 🇫🇷
Details
- Veröffentlichungs-Nr.
- EP2418678
- Aktenzeichen
- EP11173513
- Anmeldetag
- 12. Juli 2011
- Veröffentlichung
- 15. Oktober 2014
- Erteilung
- 15. Oktober 2014
- Rechtsraum
- EP
- IPC
- H01L21/762H01L21/68H01L21/67
Abstract
Method for molecular adhesion bonding between at least a first wafer (20) and a second wafer (30) comprising at least a step of mechanical alignment, a step of bringing the two wafers (20, 30) in contact and a step of initiating the propagation of a bonding wave between the two wafers. During the steps of mechanical alignment and bringing the two wafers in contact, the wafers are placed in an environment at a first pressure (P1) greater than or equal to a predetermined pressure threshold value. During the step of initiating the propagation of a bonding wave, the wafers (20, 30) are placed in an environment at a second pressure (P2) less than the said predetermined pressure threshold value.
Anmelder
- Firmen
- Soitec
S.O.I. Tec Silicon on Insulator Technologies - Land
- 🇫🇷 Frankreich
Französischer Halbleiterhersteller mit Sitz in Bernin, spezialisiert auf Silicon-on-Insulator (SOI) Substrate. Patente decken Halbleitermaterialien und Waferbondtechnik ab.
529 Patente in unserer Datenbank
Fachgebiete
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IP Trust
IP Trust · Paris
-
Fidal Innovation
Fidal Innovation · Courbevoie
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Desormiere, Pierre-Louis
NoneParis