Filmablagerungsvorrichtung
Anmelder: Fujifilm Corporation 🇯🇵
Details
- Veröffentlichungs-Nr.
- EP2423353
- Aktenzeichen
- EP11179525
- Anmeldetag
- 31. August 2011
- Veröffentlichung
- 8. Mai 2013
- Erteilung
- 8. Mai 2013
- Rechtsraum
- EP
- IPC
- C23C16/509C23C16/54
Abstract
A film deposition device (10) includes a conveyor of a strip (Z) of substrate in a conveying direction, a film deposition electrode (46) disposed so as to face the substrate, a counter electrode (42) disposed at an opposite side of the film deposition electrode, gas supplier of film deposition gases and a grounded shield (48) disposed in a planar direction of the substrate so as to surround the film deposition electrode. An upstream end portion of the film deposition electrode in the conveying direction is closer to the substrate than an upstream end portion of the grounded shield in the conveying direction corresponding to the upstream end portion of the film deposition electrode.
Anmelder
- Firma
- Fujifilm Corporation
- Land
- 🇯🇵 Japan
Japanischer Konzern, hervorgegangen aus der Fotofilmherstellung, heute aktiv in Bildgebung, Dokumentenlösungen, Materialwissenschaften sowie Diagnostik und Arzneimittelherstellung.
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Hoffmann Eitle
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