Resistzusammensetzung, Resistschicht daraus und Verfahren zur Strukturformung damit

Details

Veröffentlichungs-Nr.

EP2434343

Aktenzeichen

EP11183085

Anmeldetag

28. September 2011

Veröffentlichung

15. Mai 2019

Erteilung

15. Mai 2019

Rechtsraum

EP

IPC

G03F7/004G03F7/039G03F7/20

Abstract

Provided is a resist composition, including (A) a resin that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer, (B) a compound that when exposed to actinic rays or radiation, generates an acid, the compound being any of those of general formulae (I) and (II) below, (C) a resin containing at least either a fluorine atom or a silicon atom, and (D) a mixed solvent containing a first solvent and a second solvent, at least either the first solvent or the second solvent exhibiting a normal boiling point of 200°C or higher.

Anmelder

Firma

Fujifilm Corporation

Land

🇯🇵 Japan

Fachgebiete