Verfahren zum Betrieb eines Ionenstrahlsystems

Details

Veröffentlichungs-Nr.

EP2437279

Aktenzeichen

EP11007981

Anmeldetag

30. September 2011

Veröffentlichung

30. Mai 2018

Erteilung

30. Mai 2018

Rechtsraum

EP

IPC

H01J37/147H01J37/28

Abstract

An ion beam system comprises a voltage supply system (7) and at least one beam deflector (39) having at least one first deflection electrode (51a,51b,51c) and plural second deflection electrodes (52a,52b,52c), wherein the voltage supply system is configured to supply different adjustable deflection voltages to the plural second deflection electrodes such that electric deflection fields between the plural second deflection electrodes and the opposite at least one first deflection electrode have a common orientation. The system has a high kinetic energy mode in which a distribution of the electric deflection field has a greater width, a low kinetic energy mode in which a distribution of the electric deflection field has a smaller width.

Anmelder

Firmen

Carl Zeiss Microscopy GmbH
Carl Zeiss NTS GmbH

Land

🇩🇪 Deutschland

Fachgebiete