Reinigungsuntersystem für ein Lithographiesystem mit variablen Daten
Anmelder: Palo Alto Research Center Incorporated 🇺🇸
Details
- Veröffentlichungs-Nr.
- EP2447087
- Aktenzeichen
- EP11187190
- Anmeldetag
- 28. Oktober 2011
- Veröffentlichung
- 1. Juli 2015
- Erteilung
- 1. Juli 2015
- Rechtsraum
- EP
- IPC
- B41N3/00B41C1/10B41F31/00B41F35/02B41F7/00B41F31/02
Abstract
A cleaning method for a variable data lithography system employs a first cleaning member having a conformable adhesive surface disposed for physical contact with an imaging member such that residual ink remaining on the imaging member, such as following transfer of an inked latent image from the imaging member to a substrate, adheres to the conformable adhesive surface and is thereby removed from the imaging member. The cleaning method may further employ a second cleaning member, in physical contact with the first cleaning member, having a relatively hard, smooth surface such that residual ink removed from the imaging member and adhering to the adhesive surface of the first cleaning member may split onto the second cleaning member.
Anmelder
- Firma
- Palo Alto Research Center Incorporated
- Land
- 🇺🇸 USA
US-amerikanisches Forschungsinstitut in Palo Alto, bekannt als PARC, das für Xerox und externe Auftraggeber Grundlagen- und angewandte Forschung in Informatik, Elektronik und Materialwissenschaften betreibt.
858 Patente in unserer Datenbank
Fachgebiete
-
Gill Jennings & Every LLP
Gill Jennings & Every LLP · London