Abscheidungsvorrichtung und Verfahren

Details

Veröffentlichungs-Nr.

EP2482303

Aktenzeichen

EP12151173

Anmeldetag

13. Januar 2012

Veröffentlichung

6. April 2016

Erteilung

6. April 2016

Rechtsraum

EP

IPC

H01J37/302H01J37/305C23C14/16C23C14/32

Abstract

A deposition apparatus (20) includes a deposition chamber (22) and a deposition material source (32). An electron beam source (44) is positioned to direct a first electron beam (42) to vaporize a portion of the deposition material. A first electrode (60) is provided for generating a primary plasma (100) from the deposition material source (32). A second electrode (90) is provided for generating a secondary plasma (104) and further accelerating ions from the primary plasma (100). A bias electric potential is applied to the workpiece (26) to draw ions from the secondary plasma to the workpiece (26). A control system (88) is coupled to the electron beam source (44), the bias voltage source (48), and power supplies (62,92) for the first and second electrodes (60,90).

Anmelder

Firma

United Technologies Corporation

Land

🇺🇸 USA

Fachgebiete