Verfahren und Vorrichtung zur Konditionierung eines Polierkissens
Anmelder: EBARA CORPORATION 🇯🇵
Details
- Veröffentlichungs-Nr.
- EP2532478
- Aktenzeichen
- EP12004310
- Anmeldetag
- 6. Juni 2012
- Veröffentlichung
- 10. August 2016
- Erteilung
- 10. August 2016
- Rechtsraum
- EP
- IPC
- B24B49/18B24B53/02B24B49/00B24B53/017
Abstract
A method of and an apparatus for conditioning a surface of a polishing pad 2 is used for conditioning a polishing pad on a polishing table 1 for polishing a thin film formed on a surface of a substrate W . The conditioning method includes bringing a dresser 22 into contact with the polishing pad, and conditioning the polishing pad by moving the dresser between a central part of the polishing pad and an outer circumferential part of the polishing pad. A moving speed of the dresser at a predetermined area of the polishing pad is controlled by a controller 40 to be higher than a standard moving speed of the dresser at the predetermined area of the polishing pad.
Anmelder
- Firma
- EBARA CORPORATION
- Land
- 🇯🇵 Japan
Japanischer Hersteller von Pumpen, Kompressoren und Umwelttechnik mit Sitz in Tokio, gegründet 1912.
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