Elektrisch isolierender Gussgegenstand und Herstellungsverfahren davon
Anmelder: Kabushiki Kaisha Toshiba 🇯🇵
Details
- Veröffentlichungs-Nr.
- EP2575145
- Aktenzeichen
- EP12181005
- Anmeldetag
- 20. August 2012
- Veröffentlichung
- 26. Juli 2017
- Erteilung
- 26. Juli 2017
- Rechtsraum
- EP
- IPC
- H01B3/40C09D5/00C09D163/00B29C39/12
Abstract
An electrical insulating cast article including an adhesive interface having a high-temperature creep property excellent for a long time without deteriorating an adhesive force thereof even if a cast operation is performed after it is retained for a long period after an anodic oxidation process, is provided and a manufacturing method of the electrical insulating cast article including the adhesive interface as stated above is provided. An oxide film is made up of plural prismatic cells. A hole extending in a depth direction and opening at a surface of the prismatic cell is formed approximately in a vicinity of a center of the prismatic cell, and branch holes extending in approximately a vertical direction relative to an inner peripheral surface are further formed at the inner peripheral surface of the hole. A thickness of the oxide film is thicker than 0.5 µm and less than 2.0 µm. An adhesive is filled into each hole of the prismatic cell and of which thickness is 1 µm or more and 40 µm or less.
Anmelder
- Firma
- Kabushiki Kaisha Toshiba
- Land
- 🇯🇵 Japan
Japanischer Konzern, der Elektronik, Halbleiter, Energie- und Infrastrukturtechnik sowie Industrieanlagen entwickelt und herstellt.
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Vertreten von
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Hoffmann Eitle
Hoffmann Eitle · München