Herstellungsverfahren eines Druckmotivs auf Platte oder Maske durch Elektronenstrahl-Lithografie, entsprechendes Entwurfssystem eines gedruckten Schaltkreises und entsprechendes Computerprogramm

Details

Veröffentlichungs-Nr.

EP2701006

Aktenzeichen

EP13179124

Anmeldetag

2. August 2013

Veröffentlichung

4. November 2015

Erteilung

4. November 2015

Rechtsraum

EP

IPC

H01J37/317G03F7/20G06F17/50// G03F1/70B82Y10/00B82Y40/00

Abstract

The method involves modeling (102) a pattern (C) by breaking down the pattern into a set of elementary geometric shapes intended to be printed individually so as to reproduce the pattern. The model is recorded in a memory. A dose of electrical charges to be applied to an electron beam during individual printing of the shape is determined (104) by a processor, where the shapes are bidimensional paving of identical elementary geometric shapes covering the pattern to be printed. Discretisation error correction is performed by dithering when the dose is determined. Independent claims are also included for the following: (1) a computer program downloadable from a communication network and/or recorded on a medium-readable by a computer and/or executed by a processor, comprising instructions to perform a method for preparing a pattern to be printed by electron beam lithography (2) a system for designing a printed circuit by printing of patterns on a plate or mask using electron beam lithography.

Anmelder

Firmen

Commissariat à l'Énergie Atomique et aux Énergies Alternatives
Aselta Nanographics

Land

🇫🇷 Frankreich

Fachgebiete