Oberflächenemittierendes Laserelement und Atomoszillator
Anmelder: Ricoh Company, Ltd., Ricoh Company Ltd. 🇯🇵
Details
- Veröffentlichungs-Nr.
- EP2808958
- Aktenzeichen
- EP14170377
- Anmeldetag
- 28. Mai 2014
- Veröffentlichung
- 20. Mai 2015
- Rechtsraum
- EP
- IPC
- H01S5/183H01S5/40H01S5/42H03L7/26H01S5/042// G04F5/14H01S5/026H01S5/343H01S5/20
Abstract
A surface emitting laser element includes plural surface emitting lasers provided on a substrate. Each of the plural surface emitting lasers includes a first reflection mirror provided on the substrate; an active layer provided on the first reflection mirror; a wavelength adjustment region provided on the active layer; and a second reflection mirror provided on the wavelength adjustment region. The wavelength adjustment region includes a phase adjustment layer and a wavelength adjustment layer provided on the phase adjustment layer. A thickness of the wavelength adjustment region is approximately an odd multiple of a wavelength of emitted light divided by four. A thickness of the phase adjustment layer is approximately an even multiple of the wavelength of the emitted light divided by four. A thickness of the wavelength adjustment layer is different from a thickness of a wavelength adjustment layer of at least one of the other surface emitting lasers.
Anmelder
- Firmen
- Ricoh Company, Ltd.
Ricoh Company Ltd. - Land
- 🇯🇵 Japan
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