EUV Pellikel und Anordnung einschließlich dieses Pellikels sowie Montageverfahren hierfür

Details

Veröffentlichungs-Nr.

EP2896994

Aktenzeichen

EP15151391

Anmeldetag

16. Januar 2015

Veröffentlichung

30. Juni 2021

Erteilung

30. Juni 2021

Rechtsraum

EP

IPC

G03F1/00G03F1/62G03F1/64G03F1/24

Abstract

Here are disclosed a pellicle for EUV and an assembly made up of this pellicle and a mask, which brings about a projection of low contrast (intensity) shadows of a mesh structure on the mask, thus minimizing the adverse effect of the shadow on the lithographic printing; also a method for assembling such assembly is disclosed wherein the pellicle is rotated relative to the mask to minimize the shadow contrast, in terms of a contrast ratio, of the mesh structure; the angle of the rotation is 30 degrees or smaller, and the resultant contrast ratio should be 25 % or lower.

Anmelder

Firma

Shin-Etsu Chemical Co., Ltd.

Land

🇯🇵 Japan

Fachgebiete