Gestaltung von Fotomaskenrohling und Fotomaskenrohling

Details

Veröffentlichungs-Nr.

EP2980645

Aktenzeichen

EP15176765

Anmeldetag

15. Juli 2015

Veröffentlichung

29. August 2018

Erteilung

29. August 2018

Rechtsraum

EP

IPC

G03F1/50G03F1/84G03F1/38

Abstract

A method for designing a photomask blank comprising a transparent substrate and an optical film thereon is provided. The photomask blank is processed into a transmissive photomask having a pattern of optical film such that the film pattern may be transferred when exposure light is transmitted by the photomask. The optical film is selected using a specific reflectance, which is equal to the reflectance divided by the film thickness, as an index.

Anmelder

Firma

Shin-Etsu Chemical Co., Ltd.

Land

🇯🇵 Japan

Fachgebiete