Belichtungsvorrichtung und Belichtungsverfahren

Details

Veröffentlichungs-Nr.

EP3038130

Aktenzeichen

EP15189949

Anmeldetag

15. Oktober 2015

Veröffentlichung

19. Oktober 2016

Rechtsraum

EP

IPC

H01J37/04H01J37/317

Abstract

To form a complex and fine pattern by combining optical exposure technology and charged particle beam exposure technology, provided is an exposure apparatus that radiates a charged particle beam at a position corresponding to a line pattern on a sample, including a beam generating section (20, 30, 40, 50) that generates a plurality of the charged particle beams at different irradiation positions in a width direction (Y) of the line pattern; a scanning control section (190) that performs scanning with the irradiation positions of the charged particle beams along a longitudinal direction (X) of the line pattern; a selecting section (160) that selects at least one charged particle beam to irradiate the sample from among the plurality of charged particle beams, at a designated irradiation position in the longitudinal direction of the line pattern; and an irradiation control section (170) that controls the at least one selected charged particle beam to irradiate the sample.

Anmelder

Firmen

INTEL Corporation
ADVANTEST CORPORATION

Land

🇺🇸 USA

Fachgebiete