Defektinspektionsverfahren, Sortierverfahren und Herstellungsverfahren für Fotomaskenrohling

Details

Veröffentlichungs-Nr.

EP3109700

Aktenzeichen

EP16172622

Anmeldetag

2. Juni 2016

Veröffentlichung

1. Juli 2020

Erteilung

1. Juli 2020

Rechtsraum

EP

IPC

G03F1/84// G01N21/95G01B11/24

Abstract

A method of inspecting a defect present at a surface portion of a photomask blank having at least one thin film formed on a substrate by use of the inspecting optical system. The method includes setting the distance between the defect and an objective lens of an inspecting optical system to a defocus distance, applying inspection light to the defect through the objective lens, collecting reflected light from the region irradiated with the inspection light, through the objective lens, as a magnified image, identifying a light intensity variation portion of the magnified image, and determining the rugged shape of the defect on the basis of a variation in light intensity of the light intensity variation portion of the magnified image.

Anmelder

Firma

Shin-Etsu Chemical Co., Ltd.

Land

🇯🇵 Japan

Fachgebiete