Chemisch Verstärktes Resistmaterial und Verfahren zur Resiststrukturformung

Details

Veröffentlichungs-Nr.

EP3141958

Aktenzeichen

EP16188033

Anmeldetag

9. September 2016

Veröffentlichung

28. Juni 2017

Rechtsraum

EP

IPC

G03F7/004G03F7/039G03F7/20

Abstract

A chemically amplified resist material contains: (1) a polymer component that is capable of being made soluble or insoluble in a developer solution by an action of an acid; (2) a component that is capable of generating a radiation-sensitive sensitizer and an acid upon an exposure, wherein the polymer component (1) contains a first polymer having a first structural unit that includes a fluorine atom and does not include a salt structure, or a second polymer having a second structural unit that includes a fluorine atom and a salt structure, and wherein the component (2) contains component (a), any two of components (a) to (c), or all of components (a) to (c).

Anmelder

Firma

JSR Corporation

Land

🇯🇵 Japan

Fachgebiete