Positive Resistzusammensetzung, Lichthärtbarer Trockenfilm und Herstellungsverfahren Dafür, Musterbildungsverfahren und Laminat

Details

Veröffentlichungs-Nr.

EP3214497

Aktenzeichen

EP17000284

Anmeldetag

22. Februar 2017

Veröffentlichung

7. August 2019

Erteilung

7. August 2019

Rechtsraum

EP

IPC

G03F7/075G03F7/40G03F7/004G03F7/039G03F7/11G03F7/32G03F7/38G03F7/20// H01L21/027H01L21/311

Abstract

The present invention provides a positive photosensitive resin composition containing (A) a polymer compound containing a siloxane chain, the polymer compound having a repeating unit shown by the general formula (1) and a weight average molecular weight of 3,000 to 500,000, (B) a photosensitive material capable of generating an acid by light and increasing a dissolution rate in an aqueous alkaline solution, (C) a crosslinking agent, and (D) a solvent. There can be provided a positive photosensitive resin composition that can remedy the problem of delamination caused on a metal wiring such as Cu and Al, an electrode, and a substrate, especially on a substrate such as SiN, and can form a fine pattern having a forward tapered shape without generating a scum and a footing profile in the pattern bottom and on the substrate when a widely used 2.38% TMAH aqueous solution is used as the developer. <img class="EMIRef" id="467226642-ia01" />

Anmelder

Firma

Shin-Etsu Chemical Co., Ltd.

Land

🇯🇵 Japan

Fachgebiete