Messverfahren, Messvorrichtung, Lithografievorrichtung und Verfahren zur Herstellung eines Artikels

Details

Veröffentlichungs-Nr.

EP3223075

Aktenzeichen

EP17159532

Anmeldetag

7. März 2017

Veröffentlichung

19. Juni 2019

Erteilung

19. Juni 2019

Rechtsraum

EP

IPC

G03F9/00

Abstract

The present invention provides a measurement method of measuring a rotational shift amount of pattern regions arranged on a substrate with respect to a reference portion provided at an outer edge of the substrate, including obtaining a first image by capturing a target region including a target object on the substrate during detecting a position of the reference portion while rotating the substrate, obtaining a second image by capturing the target object in a state in which the substrate remains still, obtaining a third image indicating a difference between the first image and the second image by correcting the second image with the first image, and obtaining a position of the target object based on the third image and obtaining the rotational shift amount of the pattern regions with respect to the reference portion based on the obtained position of the target object.

Anmelder

Firma

Canon Kabushiki Kaisha

Land

🇯🇵 Japan

Fachgebiete