Belichtungsvorrichtung, Belichtungsverfahren und Speichermedium

Details

Veröffentlichungs-Nr.

EP3324239

Aktenzeichen

EP17202291

Anmeldetag

17. November 2017

Veröffentlichung

20. April 2022

Erteilung

20. April 2022

Rechtsraum

EP

IPC

G03F7/20

Abstract

An exposure apparatus includes: a stage on which a substrate is placed; a plurality of light irradiation units (47) configured to emit light independently of each other to different positions in a right and left direction on a surface of the substrate, so as to form a strip-like irradiation area (30) extending from one end of the surface of the substrate to the other end of the substrate; a rotation mechanism (34) configured to rotate the substrate placed on the stage relative to the irradiation area; a stage moving mechanism (36) configured to move the stage relative to the irradiation area in a back and forth direction; and a control unit (10) configured to output control signals that make said exposure apparatus perform a first step that rotates the substrate relative to the irradiation area having a first illuminance distribution such that the whole surface of the substrate is exposed, and a second step that moves the substrate in the back and forth direction relative to the irradiation area having a second illuminance distribution while rotation of the substrate is being stopped, such that the whole surface of the substrate is exposed.

Anmelder

Firma

Tokyo Electron Limited

Land

🇯🇵 Japan

Fachgebiete