Belichtungsvorrichtung, Belichtungsvorrichtunganpassungsverfahren und Speichermedium
Anmelder: TOKYO ELECTRON LIMITED, Tokyo Electron Limited 🇯🇵
Details
- Veröffentlichungs-Nr.
- EP3324240
- Aktenzeichen
- EP17202294
- Anmeldetag
- 17. November 2017
- Veröffentlichung
- 27. April 2022
- Erteilung
- 27. April 2022
- Rechtsraum
- EP
- IPC
- G03F7/20
Abstract
An exposure apparatus includes a stage (33) on which a substrate (W) is placed, a plurality of light irradiation units (46) configured to emit light independently of each other to different positions in a right and left direction on a surface of the substrate, so as to form a strip-like irradiation area (30) extending from one end of the surface of the substrate to the other end of the substrate, a stage moving mechanism (36) configured to move the stage in a back and forth direction relative to the irradiation area, such that the whole surface of the substrate is exposed, and a light receiving unit (51, etc.) configured move in the irradiation area between one end and the other end of the irradiation area in order to detect an illuminance distribution of the irradiation area in a longitudinal direction of the Irradiation area.
Anmelder
- Firmen
- TOKYO ELECTRON LIMITED
Tokyo Electron Limited - Land
- 🇯🇵 Japan
Japanisches Technologieunternehmen mit Sitz in Tokio, einer der weltweit größten Hersteller von Halbleiterfertigungsanlagen. Aktiv in Beschichtungs-, Ätz- und Reinigungssystemen für die Chip- und Displayproduktion.
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Hoffmann Eitle
Hoffmann Eitle · München