Verfahren zur Herstellung einer Vorrichtung zum Ausbilden wenigstens eines Fokussierten Strahls in einem Nahbereich

Details

Veröffentlichungs-Nr.

EP3385219

Aktenzeichen

EP17305414

Anmeldetag

7. April 2017

Veröffentlichung

14. Juli 2021

Erteilung

14. Juli 2021

Rechtsraum

EP

IPC

B82Y20/00G02B6/32G02B6/12

Abstract

The present disclosure concerns a method for manufacturing a device for forming at least one focused beam in a near zone, from an electromagnetic wave incident on said device, said method being characterized in that it comprises: - depositing a dielectric material (112) layer with a first refractive index on a substrate layer (110); - creating at least one cavity (111a, 111b, 111c) by a microfabrication technique in said dielectric material layer (112), said device for forming at least one focused beam in a near zone comprising said substrate layer (110) and said dielectric material layer (112); - filling said at least one cavity (111a, 111b, 111c) with a material having a second refractive index lower than said first refractive index; - determining a deviation between a measured focused beam radiation angle obtained from said device for forming at least one focused beam in a near zone and an expected focused beam radiation angle; - modifying locally at least one of the two refractive indexes according to said deviation.

Anmelder

Firmen

InterDigital CE Patent Holdings
Thomson Licensing

Land

🇫🇷 Frankreich

Fachgebiete