Phasenvorrichtung zur Verwendung in einer Lithografischen Vorrichtung

Details

Veröffentlichungs-Nr.

EP3385792

Aktenzeichen

EP18169639

Anmeldetag

26. April 2018

Veröffentlichung

26. Dezember 2018

Rechtsraum

EP

IPC

G03F7/20H01L21/677H01L21/68H01L21/67H01L21/687

Abstract

The invention provides a stage apparatus (101) for use in a lithographic apparatus, the stage apparatus comprising an object support (102) comprising a surface for mounting an object (105a) on, the surface extending in a plane, and a plurality of support members (103) for supporting the object, arranged to receive the object from a gripper (104) and to arrange the object on the surface and/or vice versa. The support members are moveable in at least a first direction which is perpendicular to the plane. The stage apparatus comprises a control unit comprising an input terminal for receiving shape information regarding an out-of-plane-shape of the object, and a processing unit configured to determine, based on said shape information, a supporting arrangement relating to positions of the support members relative to each other in at least the first direction. The control unit is configured to control the positions of the support members based on the supporting arrangement.

Anmelder

Firma

ASML Netherlands B.V.

Land

🇳🇱 Niederlande

Fachgebiete