Verbindungsstruktur und Zugehörige Verfahren
Anmelder: IMEC vzw 🇧🇪
Details
- Veröffentlichungs-Nr.
- EP3629372
- Aktenzeichen
- EP18197400
- Anmeldetag
- 28. September 2018
- Veröffentlichung
- 16. Juni 2021
- Erteilung
- 16. Juni 2021
- Rechtsraum
- EP
- IPC
- H01L23/522H01L21/768
Abstract
According to an aspect of the present inventive concept there is provided an interconnect structure (105) comprising: four interconnection levels including a respective dielectric layer and a set of conductive paths. The interconnect structure further comprises a first multi-level via structure (10) extending from a first interconnection level (100) to a third interconnection level (300) and forming a single unitary body passing through a second interconnection level (200) distant from any of the second set of conductive paths; and a second multi-level via structure (20) extending from the second interconnection level (200) to a fourth interconnection level (400) and forming a single unitary body passing through the third interconnection level (300) distant from any of the third set of conductive paths. There is further provided a method of forming a first multi-level via structure and a second multi-level via structure in an interconnect structure.
Anmelder
- Firma
- IMEC vzw
- Land
- 🇧🇪 Belgien
Imec ist ein belgisches Forschungszentrum mit Sitz in Leuven, das auf Nanoelektronik, Halbleitertechnologie und digitale Technologien spezialisiert ist.
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