Verfahren und Vorrichtung zur Verdichtung einer Cvi/cvd-Matrix

Details

Veröffentlichungs-Nr.

EP3653749

Aktenzeichen

EP19208990

Anmeldetag

13. November 2019

Veröffentlichung

27. Dezember 2023

Erteilung

27. Dezember 2023

Rechtsraum

EP

IPC

C23C16/04C23C16/44C23C16/455

Abstract

A chemical vapor infiltration and deposition (CVI/CVD) reactor assembly (10) includes a CVI/CVD reactor (12) and a reactant gas feed source (48). The CVI/CVD reactor (12) includes a first inlet (14) at a first end of the CVI/CVD reactor (12), a second inlet (16) at a second end of the CVI/CVD reactor (12) opposite the first end, a first outlet (18) at the second end, a second outlet (20) at the first end, and a chamber (22) in fluid communication with the first and second inlets (14, 16) and first and second outlets (18, 20) and configured to hold a substrate (80). The reactant gas feed source (48) is interchangeably and fluidly connected to the first and second inlets (14, 16) by first and second valved gas lines (54, 56), respectively.

Anmelder

Firmen

RTX Corporation
Raytheon Technologies Corporation
United Technologies Corporation

Land

🇺🇸 USA

Fachgebiete