Hochfrequenzantenne und Plasmabearbeitungsvorrichtung

Details

Veröffentlichungs-Nr.

EP3896717

Aktenzeichen

EP21168282

Anmeldetag

14. April 2021

Veröffentlichung

11. Januar 2023

Erteilung

11. Januar 2023

Rechtsraum

EP

IPC

H01J37/32H01Q1/00

Abstract

[OBJECT]To provide a radio-frequency antenna through which a high amount of current can be efficiently passed even at a radio-frequency level for plasma generation, as well as a plasma processing device utilizing the radio-frequency antenna.[MEANS FOR SOLVING PROBLEM]A radio-frequency antenna (10) according to the present invention includes a metal fiber sheet. A plasma processing device according to the present invention includes: a vacuum container (21) including a wall (211) having an opening (213); a radio-frequency antenna (10) including a metal fiber sheet and located at the opening (213); and a dielectric protection plate (12) located closer to the interior of the vacuum container (21) than the radio-frequency antenna (10) and configured to close the opening (213) in a gas-tight manner. The radio-frequency antenna (10) including a metal fiber sheet has a larger surface area and an accordingly lower impedance to a radio-frequency current than a radio-frequency antenna including a metal plate having the same outer shape. Therefore, it allows a radio-frequency current commonly used for plasma generation (e.g., at a frequency of 13.56 MHz) to be more efficiently passed through in large amounts.

Anmelder

Firmen

EMD Corporation
Tomoegawa Co., Ltd.

Land

🇯🇵 Japan

Fachgebiete