Zusammensetzung zur Bildung eines Organischen Films, Strukturierungsverfahren sowie Verbindung und Polymer zur Bildung eines Organischen Films

Details

Veröffentlichungs-Nr.

EP4155337

Aktenzeichen

EP22197086

Anmeldetag

22. September 2022

Veröffentlichung

21. Februar 2024

Erteilung

21. Februar 2024

Rechtsraum

EP

IPC

C08G61/00C07D209/04C07D209/24G03F7/09G03F7/075

Abstract

The present invention is a composition for forming an organic film, containing: a material for forming an organic film shown by the following general formula; and an organic solvent, where R<1> represents a hydrogen atom, an allyl group, or a propargyl group, R<2> represents a nitro group, a halogen atom, a hydroxy group, an alkyloxy group having 1 to 4 carbon atoms, an alkynyloxy group having 2 to 4 carbon atoms, an alkenyloxy group having 2 to 4 carbon atoms, a linear, branched, or cyclic alkyl group having 1 to 6 carbon atoms, a trifluoromethyl group, or a trifluoromethyloxy group, m = 0 or 1, n = 1 or 2, 1 = 0 or 1, k represents an integer of 0 to 2, W represents a divalent organic group having 1 to 40 carbon atoms, and each V independently represents a hydrogen atom or a linking moiety. This provides a composition for forming an organic film which allows the formation of an organic film having not only excellent heat resistance and properties of filling and planarizing a pattern formed on a substrate, but also favorable film-formability and adhesiveness to a substrate. <img class="EMIRef" id="1a816304-bb72-40b8-ab15-7ccdc05b5648-ia01" />

Anmelder

Firma

SHIN-ETSU CHEMICAL CO., LTD.

Land

🇯🇵 Japan

Fachgebiete