Photomaske, Verfahren zur Herstellung einer Linse und Verfahren zur Herstellung eines Photodetektors

Details

Veröffentlichungs-Nr.

EP4246229

Aktenzeichen

EP22191676

Anmeldetag

23. August 2022

Veröffentlichung

9. April 2025

Erteilung

9. April 2025

Rechtsraum

EP

IPC

G03F7/00B29D11/00G02B3/00H01L27/146

Abstract

According to one embodiment, a photomask includes a plurality of unit regions arranged in a first direction and a second direction crossing the first direction. Each of the unit regions includes a first region having a first light-shielding rate, and a second region having a second light-shielding rate different from the first light-shielding rate. The second region is provided around the first region. The unit regions include a first unit region and a second unit region having same size each other. A distance between the first unit region and a center of a range in which the unit regions are arranged is different from a distance between the second unit region and the center. A light-shielding rate of the first unit region is different from a light-shielding rate of the second unit region.

Anmelder

Firma

KABUSHIKI KAISHA TOSHIBA

Land

🇯🇵 Japan

Fachgebiete