Waferinspektionsvorrichtung und Verfahren zur Waferinspektion damit

Details

Veröffentlichungs-Nr.

EP4492077

Aktenzeichen

EP24187555

Anmeldetag

9. Juli 2024

Veröffentlichung

30. April 2025

Rechtsraum

EP

IPC

G01R33/032G01R33/12G01N21/95G03F7/00// G01R33/10

Abstract

Proposed are a wafer inspection apparatus and a method of inspecting a wafer using the wafer inspection apparatus. The proposed wafer inspection apparatus includes a horizontal magnetic field generation unit arranged proximate to a lateral surface of a wafer and forming a magnetic field in such a manner that lines of magnetic force propagate in a horizontal direction, a vertical magnetic field generation unit arranged under the wafer and generating a magnetic field in such a manner that lines of magnetic force propagate in a direction vertical to the wafer, an image measurement unit arranged over the wafer and measuring an image of the wafer, and a wafer movement stage moving the wafer in a first direction and a second direction.

Anmelder

Firma

Korea Research Institute of Standards and Science

Land

🇰🇷 Südkorea

Fachgebiete