Vorrichtung zur Nicht-Immersiven Nasschemischen Behandlung eines Planaren Substrats, Vorrichtung zum Halten des Substrats und System zum Transportieren des Substrats

EP4541937 Art A1 23. April 2025

Anmelder: Atotech Deutschland GmbH & Co. KG 🇩🇪

Details

Veröffentlichungs-Nr.
EP4541937
Aktenzeichen
EP23204589
Anmeldetag
19. Oktober 2023
Veröffentlichung
23. April 2025
Rechtsraum
EP
IPC
C23C18/16B05B13/02B05C3/00
Offizieller Volltext

Abstract

A device for holding a planar substrate (2) in an apparatus for non-immersive wet-chemical treatment of the substrate (2) comprises a support structure (4) comprising at least one part (5a,b,6) for engaging a support such as to hold the support structure (4) in the apparatus and at least one clamping device (10), supported by the support structure (4), for holding the substrate (2) in a plane (3). The at least one clamping devices (10) comprise at least one laterally progressing series of projections (12a-s) for engaging a major surface of a substrate (2) located in the plane (3) proximal an upper edge of the substrate (2). The device further comprises: at least one inner flow guidance part (21), having an outward-facing surface facing outwards with respect to the plane (3) and comprising a wettable surface section (25) wettable by a stream of liquid directed onto the wettable surface section (25); and at least one outer flow guidance part (23), having an inward-facing surface, wherein the inward-facing surface faces inwards with respect to the plane (3) and comprises a sloping surface section (35). The inward-facing surface of the outer flow guidance part (23) is spaced apart from the outward-facing surface of the inner flow guidance part (21) to enable liquid directed onto the wettable surface section (25) to flow onto at least the sloping section (35) of the inward-facing surface of the outer flow guidance part (23). Seen looking onto the plane (3), an edge (29) of the inner flow guidance part (21) proximal the series of projections (12a-s) and extending at least predominantly in the lateral direction is located between the series of projections (12a-s) and the wettable surface section (25), and the sloping section (35) of the inward-facing surface of the outer flow guidance (23) part slopes towards the plane (3) in a direction (-z) transverse to the lateral direction (x) and towards the series of projections (12a-s).

Anmelder

Firma
Atotech Deutschland GmbH & Co. KG
Land
🇩🇪 Deutschland
🇩🇪 Atotech Deutschland

Atotech Deutschland ist ein deutscher Anbieter von Oberflächenveredelungschemie, unter anderem für die Elektronik- und Halbleiterindustrie, und gehört zum US-Konzern MKS Instruments. Das Patentportfolio konzentriert sich deutlich auf Metallurgie und Oberflächentechnik, ergänzt durch Elektronik und Halbleitertechnik. Anmeldungen erstrecken sich von 2000 bis 2025.

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