Strahlführungseinrichtung zur Führung von Laserstrahlung sowie Lithographieanlage

Details

Veröffentlichungs-Nr.

EP4632446

Aktenzeichen

EP24169404

Anmeldetag

10. April 2024

Veröffentlichung

15. Oktober 2025

Rechtsraum

EP

IPC

G02B5/08G02B7/00G02B7/182G02B7/198G02B26/08G02B27/64G03F7/00

Abstract

The present invention concerns a beam guiding device (200) for guiding laser radiation, comprising a body (201) with an inner beam channel (202), an optical beam guiding element (205), in particular a mirror, that is arranged inside the beam channel and a bracket (203) for holding the body (201), wherein the body (201) is connected to the bracket (203) via a first flexure bearing (207), a second flexure bearing (208) and a revolute joint (209). The invention further concerns a lithography system (101), in particular extreme ultraviolet lithography system, comprising a drive laser (100) with a beam guiding device (200) as mentioned before.

Anmelder

Firmen

TRUMPF Lasersystems for Semiconductor Manufacturing SE
ASML Netherlands B.V.

Land

🇩🇪 Deutschland

Fachgebiete