Inspektionsvorrichtung und Inspektionsverfahren
Anmelder: Hamamatsu Photonics K.K. 🇯🇵
Details
- Veröffentlichungs-Nr.
- EP4711747
- Anmeldetag
- 17. Januar 2024
- Veröffentlichung
- 28. November 2024
- Rechtsraum
- EP
- IPC
- G01N21/88, G01J3/51
Abstract
An inspection apparatus for inspecting a semiconductor apparatus includes a stage configured to hold the semiconductor apparatus, an LRG filter having a transmission characteristic in which transmittance varies linearly in a predetermined wavelength range and configured to transmit or reflect emitted light generated from the semiconductor apparatus on the basis of the transmission characteristic, an infrared camera configured to capture the light transmitted through the LRG filter to output a transmission image and capture light as emitted light that has arrived without passing through the LRG filter to output a total light amount image, and a computer configured to derive wavelength information about the emitted light on the basis of the transmission image and the total light amount image.
Anmelder
- Firma
- Hamamatsu Photonics K.K.
- Land
- 🇯🇵 Japan
Japanisches Unternehmen für Photonik mit Sitz in Hamamatsu, spezialisiert auf Photodetektoren, Bildsensoren, Laser und optische Messtechnik für Wissenschaft und Industrie.
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Hoffmann Eitle
Hoffmann Eitle · München