Piezoelektrischer Stapel und Verfahren zur Herstellung eines Piezoelektrischen Stapels

Details

Veröffentlichungs-Nr.

EP4719023

Anmeldetag

3. März 2022

Veröffentlichung

1. April 2026

Rechtsraum

EP

IPC

H10N30/00(HITACHI CABLE et al.)(住友化学株式会社)

Abstract

The present invention relates to a piezoelectric stack comprising a substrate having a main surface with a diameter of 3 inches or more; and a piezoelectric film on the substrate, comprising a perovskite-type alkali niobium oxide containing potassium, sodium, niobium, and oxygen, wherein a half-value width of an X-ray rocking curve of (001) is within a range of 0.5° or more and 2.5° or less over an entire area of an inside of a main surface of the piezoelectric film excluding its periphery when performing X-ray diffraction measurement on the piezoelectric film.

Anmelder

Firma

Sumitomo Chemical Co., Ltd.

Land

🇯🇵 Japan

Fachgebiete