Verfahren zur Herstellung eines Diamantsubstrats

EP4752269 30. Januar 2025

Anmelder: Shin-Etsu Polymer Co., Ltd., SHIN-ETSU CHEMICAL CO., LTD., National University Corporation Saitama University 🇯🇵

Details

Veröffentlichungs-Nr.
EP4752269
Anmeldetag
19. Juli 2024
Veröffentlichung
30. Januar 2025
Rechtsraum
EP
Offizieller Volltext

Abstract

A new diamond substrate having a {100} plane as a main surface is created from a single crystal diamond having a {100} plane as a main surface. The method includes a step of performing prior processing on a first starting point 42A and a second starting point 42b respectively set on a first crystal face 11a and a second crystal face 11b from among crystal faces constituting a {111} plane, by condensing the laser light using the laser condenser, the first crystal face 11a and the second crystal face 11b forming a wedge structure whose tip becomes thinner toward the main surface 10a inside a single crystal diamond block 10; and a step of forming a scanning line unit 14 by condensing the laser light using the laser condenser 190, and forming a first scanning line 41a and a second scanning line 41b on the first crystal face 11a and the second crystal face 11b, respectively, using processing marks from the first starting point 42a and the second starting point 42b toward the main surface 10a, the first scanning line 41a and the second scanning line 41b being connected at the tip of the wedge structure 12.

Anmelder

Firmen
Shin-Etsu Polymer Co., Ltd.
SHIN-ETSU CHEMICAL CO., LTD.
National University Corporation Saitama University
Land
🇯🇵 Japan
🇯🇵 Shin-Etsu Chemical

Japanisches Chemieunternehmen mit Sitz in Tokio. Shin-Etsu Chemical stellt Siliziumwafer für Halbleiter, Silikonprodukte, PVC und weitere Spezialchemikalien für Elektronik-, Bau- und Industrieanwendungen her.

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