Elektronenstrahl-Bestrahlungsvorrichtung und Elektronenstrahl-Bestrahlungsverfahren

Details

Veröffentlichungs-Nr.

EP4756841

Anmeldetag

2. August 2024

Veröffentlichung

13. Februar 2025

Rechtsraum

EP

IPC

G21K5/04, G21K5/00, G21K5/10

Abstract

To provide an electron beam irradiation device and an electron beam irradiation method capable of keeping a distance between an emission surface of an electron beam irradiation unit and an irradiation target object constant when a coat layer applied to the irradiation target object is irradiated with an electron beam, thereby preventing unevenness in curing from occurring in the coat layer applied to the irradiation target object.An electron beam irradiation device 10 includes an electron beam irradiation unit 110 having an emission surface 111 from which an electron beam is emitted, an inert gas supply unit 120 having an injection port from which an inert gas is injected, a chamber portion 130 accommodating the emission surface and the injection port, a screen portion 140 located in the chamber portion and facing the emission surface, and a transport mechanism 150 configured to be able to arrange part of an irradiation target object in a space 130a located between the emission surface and the screen portion, in which the injection port is located on the emission surface side in the chamber portion and is inclined from the emission surface side toward the screen portion side, and the inert gas supply unit is configured to inject the inert gas through the injection port to a position facing the emission surface in the screen portion in a state where the part of the irradiation target object is arranged in the space located between the emission surface and the screen portion.

Anmelder

Firma

Terumo Kabushiki Kaisha

Land

🇯🇵 Japan

Fachgebiete