Prozessverwaltungsvorrichtung und Betriebsverfahren dafür

Details

Veröffentlichungs-Nr.

EP4759435

Anmeldetag

20. Januar 2025

Veröffentlichung

20. November 2025

Rechtsraum

EP

Abstract

According to an embodiment disclosed in this document, a process management device may include a coating valve that regulates supply of slurry to a coating die, a circulation valve that regulates circulation of the slurry, a circulation pump that forms the circulation of the slurry, and a controller that controls at least one of the coating valve, the circulation valve, and the circulation pump based on a first signal related to whether coating of an electrode current collector is in progress and a second signal related to whether the coating die is open.

Anmelder

Firma

LG Energy Solution, Ltd.

Land

🇰🇷 Südkorea