Durchlässige Euv-Lithographievorrichtung

Details

Veröffentlichungs-Nr.

EP4760392

Anmeldetag

1. September 2025

Veröffentlichung

17. Juni 2026

Rechtsraum

EP

IPC

G03F7/00

Abstract

The present invention relates to a transmissive EUV lithography device, comprising, in a lithography device: an EUV light source; a first membrane-type diffractive optical element that transmits EUV light output from the EUV light source to provide illumination light; a transmissive EUV mask that generates a pattern light to be patterned on a wafer with the EUV light transmitted through the first membrane-type diffractive optical element; and a second membrane-type diffractive optical element for exposing the wafer to the pattern light generated from the transmissive EUV mask. In addition, the EUV light source is composed of an EUV light source with a wavelength of 13.5 nm generated by a plasma reaction through a Lithium or lithium alloy target. In addition, the first membrane-type diffractive optical element and the second membrane-type diffractive optical element are zone-plate lenses.

Anmelder

Firma

E-SOL, Inc.

Land

🇰🇷 Südkorea

Fachgebiete