Oniumsalz, Chemisch Verstärkte Positiv Arbeitende Resistzusammensetzung und Verfahren zur Herstellung von Resistmustern

Details

Veröffentlichungs-Nr.

EP4760394

Anmeldetag

12. Dezember 2025

Veröffentlichung

17. Juni 2026

Rechtsraum

EP

IPC

G03F7/004, G03F7/039

Abstract

An onium salt in which 2, 3 or 4 aryl groups having an acid labile group of ether form are present on an aromatic ring having -SO<3>- bonded thereto, and at least one aryl group having an ether type acid labile group is bonded to a carbon atom adjoining the carbon atom to which -SO<3>- is bonded generates an arenesulfonic acid with adequate acidity and controlled diffusion. A chemically amplified positive resist composition comprising the onium salt has a high resolution and forms a pattern of rectangular profile with reduced LER and few development defects.

Anmelder

Firma

Shin-Etsu Chemical Co., Ltd.

Land

🇯🇵 Japan

Fachgebiete