Verfahren und System zur Quantitativen und Zeitaufgelösten Messung des Materialflusses eines auf eine Oberfläche Wirkenden Plasmas

Details

Veröffentlichungs-Nr.

EP4760772

Anmeldetag

10. Dezember 2024

Veröffentlichung

17. Juni 2026

Rechtsraum

EP

Abstract

The invention relates to a method for quantitatively and temporally characterizing particles of a plasma by means of a probe, the plasma comprising at least ions and neutrals. The method comprises:- applying several plasma pulses,- for each plasma pulse considered, applying a bias pulse consisting in applying a bias voltage on the probe, this voltage being intended to prevent the ions from reaching the probe.The total plasma duration is partitioned into N parts or time-steps of duration δT, the method further comprising the following steps:- for each plasma pulse considered, a bias pulse is applied with a temporal overlap zone between the plasma pulse and the bias pulse, the temporal overlap zone being different on each application of a bias pulse, the temporal overlap zones sweeping the entire total plasma duration in steps of duration δT,- for each plasma pulse considered, carrying out, over at least the entire total plasma duration, a quantitative measurement Qn of the ions and neutrals reaching the probe, n ranging from 1 to N.

Anmelder

Firmen

Centre National de la Recherche Scientifique
Université Paris-Saclay
Institut of Physics of the Czech Academy of Sciences

Land

🇫🇷 Frankreich