Teilchenstrahlschreibverfahren mit einer Streifenbelichtungsreihenfolge in einem Endlichen Streifenfenster

Details

Veröffentlichungs-Nr.

EP4769476

Anmeldetag

23. Dezember 2025

Veröffentlichung

1. Juli 2026

Rechtsraum

EP

IPC

H01J37/302, H01J37/317

Abstract

For irradiating a target with a charged-particle beam, a plurality of stripes are written using the beam at respective stripe locations (y₀-y₁₅). In order to reduce charging effects during irradiation, the time sequence of the stripes, expressed as a function y(k) of a time index k, is different from a direct linear order. Based on a pre-determined integer number w ("stripe wing number") which is not larger than the number of stripes divided by at least 4, the time sequence for writing the stripe of location y(k) at time index k is rearranged so as to comply with the condition that the stripe at a location y(k) is at most w stripe locations before the stripe location y_k and at most w stripe locations behind the stripe location y_k, and/or between each pair of spatially directly neighboring stripes, at most 2w different stripes are written.

Anmelder

Firma

IMS Nanofabrication GmbH

Land

🇦🇹 Österreich

Fachgebiete