Maske und Verfahren zur Herstellung der Maske

Details

Veröffentlichungs-Nr.

EP4772667

Anmeldetag

28. August 2024

Veröffentlichung

6. März 2025

Rechtsraum

EP

Abstract

A mask may include a base material that includes a base-material first surface, a base-material second surface located opposite the base-material first surface, and at least one first opening that extends from the base-material first surface to the base-material second surface, and a multilayer body including a magnetic layer that includes a first surface facing the base-material second surface and a second surface located opposite the first surface and that contains magnetic metal and a non-magnetic layer located between the magnetic layer and the first surface or between the magnetic layer and the second surface. The multilayer body may include a pattern region that overlaps the first opening in plan view and that includes multiple second openings extending through the magnetic layer and the non-magnetic layer, a surrounding region that surrounds the pattern region in plan view, and an outer edge region that surrounds the surrounding region in plan view and that is located along an outer edge of the multilayer body.

Anmelder

Firma

Dai Nippon Printing Co., Ltd.

Land

🇯🇵 Japan