Verfahren zur Herstellung einer Dünnschicht und Rohmaterial zur Herstellung einer Dünnschicht

Details

Veröffentlichungs-Nr.

EP4772669

Anmeldetag

22. August 2024

Veröffentlichung

6. März 2025

Rechtsraum

EP

Abstract

The present invention provides: a method of producing a thin-film, including forming a bismuth metal thin-film by using a bismuth compound represented by the following general formula (1) and at least one kind selected from Bi(SiMe<3>)<3> and a reducing gas; and to a thin-film forming raw material: <img class="EMIRef" id="5d0d2712-8357-4849-b1c6-fc6d5a776caa-ia01" /> in the general formula (1), R<1> represents a hydrogen atom or a hydrocarbon group having 1 or more and 5 or less carbon atoms, and R<2>, R<3>, and R<4> each independently represent an alkyl group having 1 or more and 3 or less carbon atoms.

Anmelder

Firma

ADEKA CORPORATION

Land

🇯🇵 Japan