Rotationssprühbeschichtungssystem

Details

Veröffentlichungs-Nr.

EP4773793

Anmeldetag

17. Dezember 2025

Veröffentlichung

8. Juli 2026

Rechtsraum

EP

IPC

H10P72/00, H10P72/76

Abstract

A spin-spray coating system adapted for coating a wafer (8) includes a base unit (10) and a top unit (20). The base unit (10) includes a base body (11) extending around a central axis (A) that extends vertically. The base body (11) has a top surface (110), an annular groove (113) recessed from the top surface (110), and extending around the central axis (A), and an outer cup support section (112) formed on the top surface (110), and extending around the central axis (A). The top unit (20) is removably mounted on the base unit (10), and includes a seat member (21) extending around the central axis (A), and removably inserted into the annular groove (113), and an outer cup member (24) extending around the central axis (A), disposed above the seat member (21), and removably engaging with the outer cup support section (112).

Anmelder

Firma

Scientech Corporation

Land

🇹🇼 Taiwan

Fachgebiete