Implementierung von Mikro- und Nanostrukturen auf Anisotropen Materialien

Details

Veröffentlichungs-Nr.

EP4775528

Anmeldetag

16. April 2025

Veröffentlichung

15. Juli 2026

Rechtsraum

EP

IPC

B81C1/00, G02B6/136

Abstract

The present disclosure relates to a system for use in a process for implementing a miniaturized structure of an anisotropic material, the system comprising a lithography system for defining an etching mask compatible with the shape of the miniaturized structure, a dry etching system used to define the sidewalls and facts of the miniaturized structure, a chemical etching system used to define the bottom profile of the miniaturized structure. Optionally the etching system may be replaced or complemented by another system capable of dicing, cutting or ablating the anisotropic crystal so to define the sidewalls and facets of the miniaturized structure. The system may comprise also a tool to transfer the miniaturized structure from the bulk wafer where it was structured to a new substrate. The present disclosure further relates to a method for obtaining a micro- or nano-structure starting from a monolithic wafer of an anisotropic material with thickness between several tens of microns and few millimeters.

Anmelder

Firma

LiNPhA AB

Land

🇸🇪 Schweden

Fachgebiete