Bestimmungsverfahren, Musterübertragungsverfahren, Artikelherstellungsverfahren, Programm, Informationsverarbeitungsvorrichtung und Lithografiesystem

Details

Veröffentlichungs-Nr.

EP4790488

Anmeldetag

1. Oktober 2024

Veröffentlichung

10. April 2025

Rechtsraum

EP

IPC

G03F9/00, G03F7/20

Abstract

A determination method includes a generation step of generating correction measurement data by removing a component dependent on an array of a plurality of shot regions of a first substrate onto which a pattern is transferred by a lithography apparatus from measurement data of the first substrate; and a determination step of determining a correction value to be provided to the lithography apparatus when transferring a pattern onto a second substrate by using the lithography apparatus based on the correction measurement data and an array of a plurality of shot regions of the second substrate.

Anmelder

Firma

Canon Kabushiki Kaisha

Land

🇯🇵 Japan

Fachgebiete