Maske und Verfahren zur Herstellung der Maske

Details

Veröffentlichungs-Nr.

EP4807039

Anmeldetag

7. November 2024

Veröffentlichung

15. Mai 2025

Rechtsraum

EP

Abstract

A mask may include: a first layer including a first surface and a second surface located opposite the first surface and having at least one first opening extending through the first layer; a second layer including a third surface facing the first surface and a fourth surface located opposite the third surface and having a second opening extending through the second layer at a position overlapping the first opening in plan view; and a third layer including a fifth surface facing the second opening and/or the fourth surface and a sixth surface located opposite the fifth surface and having multiple third openings extending through the third layer at positions overlapping the first opening and the second opening in plan view. The second layer may contain silicon oxide, silicon nitride, or silicon oxynitride. The third layer may contain silicon or metal.

Anmelder

Firma

Dai Nippon Printing Co., Ltd.

Land

🇯🇵 Japan