Gegenverzerrungsverfahren für eine Dünnwandige Struktur
Anmelder: RTX Corporation 🇺🇸
Details
- Veröffentlichungs-Nr.
- EP4817763
- Anmeldetag
- 2. März 2026
- Veröffentlichung
- 7. Oktober 2026
- Rechtsraum
- EP
Abstract
A thin walled structure (100) includes a primary structure wall (104) connected to a shielding wall (102) with a plurality of support pins (106) that extend from the shielding wall (102) to the primary structure wall (104). A method for printing a thin walled structure (100) includes the steps of: modeling, using distortion analysis software, a method of making a primary structure wall (104) to generate a distortion analysis; inputting the distortion analysis into a digital model of the primary structure wall (104) to determine a desirable layout and thickness for a support wall (102) and a plurality of support pins (106) that will connect with the primary support structure wall (104) to form a thin walled structure (100); integrating the desirable layout and thickness for a support wall (102) and a plurality of support pins (106) into a build model of the primary structure wall (104) to create a supported build model; and printing, using the supported build model, the thin walled structure (100).
Anmelder
- Firma
- RTX Corporation
- Land
- 🇺🇸 USA
US-amerikanischer Luft- und Raumfahrt- sowie Verteidigungskonzern, entstanden aus Raytheon und United Technologies. Entwickelt und fertigt Triebwerke, Avionik, Radarsysteme, Raketen- und Verteidigungstechnik für zivile und militärische Kunden.
10.583 Patente in unserer Datenbank