Verfahren zur Erzeugung von Probendaten zur Entwicklung oder Bewertung von Qualitätsinspektionsverfahren für Photolithographische Masken

Details

Veröffentlichungs-Nr.

EP4818804

Anmeldetag

1. April 2025

Veröffentlichung

7. Oktober 2026

Rechtsraum

EP

IPC

G03F1/70, G03F7/00

Abstract

The invention relates to a computer implemented method for generating sample data, the method comprising: providing multiple mask models (24) of photolithography masks comprising structures (33); modifying the multiple mask models (24) of photolithography masks using a first machine learning model (28), wherein the first machine learning model (28) receives a mask model (24) of a photolithography mask (14) and a text (26) describing one or more desired modifications (38) and generates one or more modified mask models (34, 34') or images (36, 36') of the one or more modified mask models (34, 34'); generating sample data (40) comprising images (36, 36') of the multiple modified mask models (34, 34') of photolithography masks, wherein the sample data is configured for developing or evaluating a method for quality inspection of photolithography masks. The invention also relates to a corresponding training method and system.

Anmelder

Firma

Carl Zeiss SMT GmbH

Land

🇩🇪 Deutschland

Fachgebiete