Plasmaerzeugungsmechanismus und Lichtquellenvorrichtung
Anmelder: Ushio Denki Kabushiki Kaisha 🇯🇵
Details
- Veröffentlichungs-Nr.
- EP4822439
- Anmeldetag
- 15. Oktober 2024
- Veröffentlichung
- 19. Juni 2025
- Rechtsraum
- EP
- IPC
- G03F7/20, H05G2/00
Abstract
To provide a plasma generation mechanism and a light source apparatus that are capable of preventing malfunctions caused by debris generated along with plasma generation.A plasma generation mechanism according to an embodiment of the present invention is a plasma generation mechanism included in a light source apparatus that converts a liquid plasma raw material into plasma by irradiation of an energy beam and extracts radiation, the plasma generation mechanism including a rotation body, a rotational drive source, a raw material supply section, and a debris reflecting surface. The rotation body has a rotation surface, the rotation surface being a surface that rotates about a rotation axis. The rotational drive source rotates the rotation body about the rotation axis. The raw material supply section supplies the plasma raw material to the rotation body. The debris reflecting surface faces in a direction normal to an irradiation position that is irradiated with the energy beam, and reflects debris incident from the irradiation position in a direction different from an incident path of the energy beam to the irradiation position.
Anmelder
- Firma
- Ushio Denki Kabushiki Kaisha
- Land
- 🇯🇵 Japan
Japanischer Hersteller von Lichtquellen wie Speziallampen, Lasern und LED-Modulen für Industrie, Halbleiterfertigung und Optik mit Sitz in Tokio.
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