Verfahren zur Herstellung einer ferroelektrischen Dünnschicht

Details

Veröffentlichungs-Nr.

EP2525391

Aktenzeichen

EP12168002

Anmeldetag

15. Mai 2012

Veröffentlichung

11. August 2021

Erteilung

11. August 2021

Rechtsraum

EP

IPC

H01L21/02H01L21/316H01L41/08H01L41/319H01L49/02H01L21/28

Abstract

A method for producing a ferroelectric thin film (14) comprises: coating a composition for forming a ferroelectric thin film on a substrate having a substrate body (10) and a base electrode (11) that has crystal faces oriented in the (111) direction, wherein the method includes formation of an orientation controlling layer (13) by coating the composition on the base electrode, calcining the coated composition, and firing the coated composition, where an amount of the composition coated on the base electrode is controlled such that a thickness of the orientation controlling layer after crystallization is in a range of 35 nm to 150 nm, and thereby controlling the preferential crystal orientation of the orientation controlling layer in the (100) plane.

Anmelder

Firma

Mitsubishi Materials Corporation

Land

🇯🇵 Japan

Fachgebiete