Vorrichtung und Verfahren zur Reinigung eines Substrates
Anmelder: EBARA CORPORATION 🇯🇵
Details
- Veröffentlichungs-Nr.
- EP2631935
- Aktenzeichen
- EP13000929
- Anmeldetag
- 25. Februar 2013
- Veröffentlichung
- 20. Mai 2020
- Erteilung
- 20. Mai 2020
- Rechtsraum
- EP
- IPC
- H01L21/67
Abstract
A substrate cleaning apparatus for cleaning a substrate is provided. The apparatus includes a cleaning bath in which a substrate holder holding a substrate is disposed in a vertical position, the substrate holder having a sealing member contacting a periphery of a surface of the substrate to seal a gap between the substrate and the substrate holder, and cleaning nozzles each configured to supply a jet of cleaning water to the substrate holder. The cleaning nozzles are disposed in the cleaning bath and arranged concentrically with a contact portion of the substrate surface contacting the sealing member and located at such positions that the jet of cleaning water impinges on the contact portion or its vicinity in an upper half of the substrate.
Anmelder
- Firma
- EBARA CORPORATION
- Land
- 🇯🇵 Japan
Japanischer Hersteller von Pumpen, Kompressoren und Umwelttechnik mit Sitz in Tokio, gegründet 1912.
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Fachgebiete
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Wagner & Geyer
Wagner & Geyer · München